Semiconductor manufacturing gas flow divider system and method

Details Semiconductor manufacturing gas flow divider system and method Semiconductor manufacturing gas flow divider system and method

2006-07-04

2006-07-04

Gandhi, Jayprakash N. (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Mechanical control system

C700S121000, C137S101000, C702S045000

Reexamination Certificate

active

07072743

ABSTRACT:
A system for dividing a single flow into two or more secondary flows of desired ratios, including an inlet adapted to receive the single flow, at least two secondary flow lines connected to the inlet, an input device adapted to receive at least one desired ratio of flow, at least one in-situ process monitor providing measurements of products produced by each of the flows lines, and a controller connected to the input device and the in-situ process monitor. The controller is programmed to receive the desired ratio of flow through the input device, receive the product measurements from the in-situ process monitor, and calculate a corrected ratio of flow based upon the desired ratio of flow and the product measurements. If the product measurements are not equal, then the corrected ratio of flow will be different than the desired ratio of flow.

REFERENCES:
patent: 4369031 (1983-01-01), Goldman et al.
patent: 5040470 (1991-08-01), Lofton et al.
patent: 5289678 (1994-03-01), Grutter
patent: 5387309 (1995-02-01), Bobel et al.
patent: 5453124 (1995-09-01), Moslehi et al.
patent: 5624498 (1997-04-01), Lee et al.
patent: 5719495 (1998-02-01), Moslehi
patent: 5976261 (1999-11-01), Moslehi et al.
patent: 6113733 (2000-09-01), Eriguchi et al.
patent: 6117348 (2000-09-01), Peng et al.
patent: 6251187 (2001-06-01), Li et al.
patent: 6278809 (2001-08-01), Johnson et al.
patent: 6302964 (2001-10-01), Umotoy et al.
patent: 6333272 (2001-12-01), McMillin et al.
patent: 6418954 (2002-07-01), Taylor et al.
patent: 6563578 (2003-05-01), Halliyal et al.
patent: 6633391 (2003-10-01), Oluseyi et al.
patent: 6676760 (2004-01-01), Kholodenko et al.
patent: 6813534 (2004-11-01), Sui et al.
patent: 6829056 (2004-12-01), Barnes et al.

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