Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2011-01-04
2011-01-04
Hassanzadeh, Parviz (Department: 1716)
Coating apparatus
Gas or vapor deposition
Work support
C118S715000, C118S724000, C118S725000, C156S345370, C156S345510, C156S345520, C156S345530, C361S234000
Reexamination Certificate
active
07862659
ABSTRACT:
The present invention relates to a semiconductor manufacturing device that a maintenance or a repairing is easy so that an efficiency of manufacturing can be enhanced because a high temperature of a susceptor can be rapidly down. The present invention relates to a semiconductor manufacturing device that an efficiency of manufacturing can be enhanced because a heater for heating the semiconductor is heated by an external heating device.
REFERENCES:
patent: 2002/0195438 (2002-12-01), Babikian
patent: 2005/0229854 (2005-10-01), Moroz
patent: 2008/0083732 (2008-04-01), Shinma et al.
Byun Jae-ho
Lim You-Dong
Dhingra Rakesh
Hassanzadeh Parviz
Porzio, Bromberg & Newman P.C.
TTS Co., Ltd.
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