Semiconductor manufacturing device

Details Semiconductor manufacturing device Semiconductor manufacturing device

2011-04-12

2011-04-12

Moore, Karla (Department: 1716)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C118S7230AN, C156S345310

Reexamination Certificate

active

07922819

ABSTRACT:
Reduction in a space of a manufacturing line, improvement of efficiency, improvement of utilization efficiency of materials, additionally, reduction in the manufacturing cost is realized by applying a means for describing a wiring pattern or a resist pattern directly on a substrate, a means for locally performing a vapor phase process such as film formation or etching under atmospheric pressure or adjacent to atmospheric pressure.

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