Semiconductor manufacturing device

Details Semiconductor manufacturing device Semiconductor manufacturing device

Filed on

1988-09-28

Date issued

1991-01-22

Examiner

Bueker, Richard

Patent Class

Coating apparatus

SubClass

Gas or vapor deposition

SubSubClass

Multizone chamber

Other Related Categories

118722, 118725, 118 501, C23C 1648, C23C 1650

Type

Patent

Status

active

Patent number

049862138

Description

ABSTRACT:
An improved semiconductor processing is desclosed. In the manufacturing process, just formed semiconductor layer undergoes photo annealing and latent dangling bonds are let appear on the surface and gaps, then neutralizer is introduced to the ambience of the semiconductor. The semiconductor thus formed demonstrates SEL effect in place of Staebler-Wronski effect.

REFERENCES:
patent: 4313783 (1982-02-01), Davies
patent: 4398343 (1983-08-01), Yamazaki
patent: 4405435 (1983-09-01), Tateishi
patent: 4482395 (1984-11-01), Hiramoto
patent: 4498416 (1985-02-01), Bouchaib
patent: 4503807 (1985-03-01), Nakayama
patent: 4582720 (1986-04-01), Yamazaki
patent: 4592306 (1986-06-01), Gallego
patent: 4592799 (1986-06-01), Hayafuji
patent: 4640223 (1987-02-01), Dozier
patent: 4694143 (1987-09-01), Nishimura
patent: 4698486 (1987-10-01), Sheets
patent: 4699863 (1987-10-01), Sawatari
Kuwano, Photovoltaic Behavior of Amorphous Si:H and Si:F:H Solar Cells, Conference Record, 15th IEEE Photovoltaic Specialists Conf., Kissimmee, Fla, May 12-15, 1981, Published Aug. 1981, pp. 698-703.

Affiliated with

Also associated with

Rating

Semiconductor manufacturing device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor manufacturing device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor manufacturing device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1548198