Semiconductor manufacturing device

Coating apparatus – Gas or vapor deposition – Multizone chamber

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118722, 118725, 118 501, C23C 1648, C23C 1650

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active

049862138

ABSTRACT:
An improved semiconductor processing is desclosed. In the manufacturing process, just formed semiconductor layer undergoes photo annealing and latent dangling bonds are let appear on the surface and gaps, then neutralizer is introduced to the ambience of the semiconductor. The semiconductor thus formed demonstrates SEL effect in place of Staebler-Wronski effect.

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patent: 4699863 (1987-10-01), Sawatari
Kuwano, Photovoltaic Behavior of Amorphous Si:H and Si:F:H Solar Cells, Conference Record, 15th IEEE Photovoltaic Specialists Conf., Kissimmee, Fla, May 12-15, 1981, Published Aug. 1981, pp. 698-703.

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