Semiconductor manufacturing device

Details Semiconductor manufacturing device Semiconductor manufacturing device

1988-09-28

1991-01-22

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118722, 118725, 118 501, C23C 1648, C23C 1650

Patent

active

049862138

ABSTRACT:
An improved semiconductor processing is desclosed. In the manufacturing process, just formed semiconductor layer undergoes photo annealing and latent dangling bonds are let appear on the surface and gaps, then neutralizer is introduced to the ambience of the semiconductor. The semiconductor thus formed demonstrates SEL effect in place of Staebler-Wronski effect.

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Kuwano, Photovoltaic Behavior of Amorphous Si:H and Si:F:H Solar Cells, Conference Record, 15th IEEE Photovoltaic Specialists Conf., Kissimmee, Fla, May 12-15, 1981, Published Aug. 1981, pp. 698-703.

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