Semiconductor manufacturing apparatus including temperature cont

Details Semiconductor manufacturing apparatus including temperature cont Semiconductor manufacturing apparatus including temperature cont

1997-08-21

1999-10-05

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

4272551, 118715, 118724, 118725, 118728, 118666, C23C 1600

Patent

active

RE0363286

ABSTRACT:
A semiconductor manufacturing apparatus includes a furnace having a tubular body with inner and outer tubular members. A boat having wafers mounted thereon is positioned inside the inner tubular member. Temperature control inside the tubular body is provided by a thermocouple device located between the inner and outer tubular members. A mixture of dichlorosilane gas and ammonium gas formed by a mixing nozzle at a temperature which is lower than the temperature in the tubular body is supplied to the wafers from positions juxtaposed with the wafers mounted on the boat.

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