Semiconductor manufacturing apparatus having a plurality of meas

Details Semiconductor manufacturing apparatus having a plurality of meas Semiconductor manufacturing apparatus having a plurality of meas

1995-04-26

1997-08-19

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

356358, H01L 2166, H01L 2168, B65G 4907

Patent

active

056587007

ABSTRACT:
An exposure apparatus for manufacturing semiconductors is provided in order to make stages for carrying a wafer compact and to increase their rigidity. The apparatus has an exposure optical system, stages for carrying a wafer, a section for moving the stages relative to the exposure optical system, and first and second measurement sections. The first measurement section measures the positions of the stages, including the positions of the stages when the wafer is exposed to incident radiation. The second measurement means measures at least the positions of the stages at a wafer replacement position, where the first measurement means cannot be used for measurement.

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patent: 5062712 (1991-11-01), Sakuta
patent: 5184055 (1993-02-01), Ohishi et al.

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