Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Reexamination Certificate
2007-10-30
2007-10-30
Rutledge, D. (Department: 2851)
Photography
Fluid-treating apparatus
Fluid application to one side only of photographic medium
C414S935000
Reexamination Certificate
active
11354987
ABSTRACT:
A semiconductor manufacturing apparatus includes a transfer mechanism including a moving part for holding a substrate to be processed and moving along a longitudinal transferring passage and a plurality of processing units for performing respective processes on the substrate. The processing units are disposed along the transferring passage and the substrate is transferred between the processing units and the transfer mechanism. An exhaust chamber is provided under the processing units, the exhaust chamber having a gas exhaust opening at the side of the transferring passage, the exhaust chamber. Further, a suction exhaust line is connected to the exhaust chamber, and a guide member is provided inside the exhaust chamber or at a position facing the opening, wherein the guide member extends along the transferring passage.
REFERENCES:
patent: 3337677 (2002-08-01), None
Akimoto Masami
Enokida Suguru
Hayashi Shin'ichi
Matsuoka Nobuaki
Nakashima Tsunenaga
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Rutledge D.
Tokyo Electron Limited
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