Semiconductor manufacturing apparatus and control system and...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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Details

C700S029000, C700S032000, C700S108000

Reexamination Certificate

active

07908025

ABSTRACT:
Disclosed herein is technology for, among other things, a semiconductor manufacturing apparatus, and a control system and a control method therefor, by which a target parameter that is measured from a wafer processed with a plurality of processing parameters that are processing conditions of the semiconductor manufacturing apparatus to process a wafer, a multiple classification analysis is performed with the plurality of processing parameters and the target parameter to calculate a model formula expressing the target parameter in a selected parameter, a predicted value of the target parameter of the wafer being processed by use of the model formula is calculated, while the processing is being performed, the processing parameters of the processing is modified on the basis of the predicted value, and the processing is continuously performed.

REFERENCES:
patent: 2005/0245170 (2005-11-01), Swedek et al.
patent: 2009/0005894 (2009-01-01), Bomholt et al.
patent: 2003197609 (2003-07-01), None
patent: 2004527117 (2004-02-01), None
patent: 20040085216 (2005-09-01), None

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