Semiconductor manufacturing apparatus

Details Semiconductor manufacturing apparatus Semiconductor manufacturing apparatus

1989-07-31

1991-01-22

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118715, 118725, 156345, C23C 1600

Patent

active

049862162

ABSTRACT:
A semiconductor manufacturing apparatus includes members for uniformly supplying a reactant gas into a chamber and uniformly discharging it from the chamber, and two rectifying members disposed on opposite sides of a substrate for making the flow rate and the direction of the reactant gas constant. This arrangement ensures that the surface of the substrate is processed with a high degree of accuracy.

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