Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-10-09
2007-10-09
MacArthur, Sylvia R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S725000, C156S345520, C156S345530
Reexamination Certificate
active
10987304
ABSTRACT:
To provide a semiconductor manufacturing device, which is provided with a wafer holder capable of improving the cooling rate of a heater and retaining the homogeneity of the temperature distribution of the heater at cooling time and which can markedly shorten the time period for treating a semiconductor wafer.The wafer holder includes the heater1for carrying the semiconductor wafer thereon to heat the same, and the cooling block2for cooling the heater1. The cooling block2is arranged so as to come into and out of abutment against the back1bof the heater on the side opposed to the wafer carrying face1a, and its abutment face2ato abut against the heater1has a warpage of 1 mm or less. The cooling block2can be provided therein with a passage for a cooling liquid. It is preferred that the passage has a sectional area of 1 mm2or larger over 80% of its entire length, and that the area of the portion having the passage formed is 3% or larger of the entire area of the abutment face2a.
REFERENCES:
patent: 5665166 (1997-09-01), Deguchi et al.
patent: 6072163 (2000-06-01), Armstrong et al.
patent: 6963052 (2005-11-01), Kuibira et al.
patent: 2005/0160988 (2005-07-01), Shinma et al.
patent: 2005/0170651 (2005-08-01), Shinma et al.
patent: 2005/0178334 (2005-08-01), Shinma et al.
patent: 2005/0274325 (2005-12-01), Kuibira et al.
patent: 2003-506279 (2002-02-01), None
patent: 2002-329566 (2002-11-01), None
patent: 2003-100856 (2003-04-01), None
patent: 2003-223971 (2003-08-01), None
patent: 2004-014655 (2004-01-01), None
patent: WO 99/45745 (1999-09-01), None
Japanese Office Action issued in corresponding Japanese Patent Application No. 2003-387741, dated Dec. 5, 2006.
Nakata Hirohiko
Natsuhara Masuhiro
Shinma Kenji
MacArthur Sylvia R.
McDermott Will & Emery LLP
Sumitomo Electric Industries Ltd.
LandOfFree
Semiconductor manufacturing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Semiconductor manufacturing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor manufacturing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3900028