Coating processes – Coating by vapor – gas – or smoke
Patent
1996-03-20
1999-10-19
Bueker, Richard
Coating processes
Coating by vapor, gas, or smoke
118715, 438758, C23C 1600
Patent
active
059685930
ABSTRACT:
A semiconductor manufacturing apparatus including a heating device; a reaction tube disposed within the heating device, the reaction tube having a gas inlet portion and an exhaust portion parted from each other by a predetermined distance in the longitudinal direction of the reaction tube; and a plurality of gas feed pipes extending along a side wall of the reaction tube from the exhaust portion side to the gas inlet portion, the plurality of gas feed pipes being parted from each other. The reaction gas is provided through the plurality of gas feed pipes into the reaction tube, thereby providing an improved uniform temperature distribution within the reaction tube and resulting in an improved uniform film thickness of the oxide film formed on the surface of the semiconductor wafer.
Nakamura Naoto
Sakamoto Ichiro
Bueker Richard
Kokusai Electric Co. Ltd.
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