semiconductor light emitting devices

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – Active layer of indirect band gap semiconductor

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257 76, 257103, 257 96, 257 97, 257 13, 372 44, 372 45, H01L 3300

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active

060721960

ABSTRACT:
Nitrogen-containing III-V alloy semiconductor materials have both a conduction band offset .DELTA.Ec and a valence band offset .DELTA.Ev large enough for the practical applications to light emitting devices. The semiconductor materials are capable of providing laser diodes, having excellent temperature characteristics with emission wavelengths in the red spectral region and of 600 nm or smaller, and high brightness light emitting diodes with emission wavelengths in the visible spectral region. The light emitting device is fabricated on an n-GaAs substrate, which has the direction normal to the substrate surface is misoriented by 15.degree. from the direction normal to the (100) plane toward the [011] direction. On the substrate, there disposed by MOCVD, for example, are an n-GaAs buffer layer, an n-(Al.sub.0.7 Ga.sub.0.3).sub.0.51 In.sub.0.49 P cladding layer, an (Al.sub.0.2 Ga.sub.0.8).sub.0.49 In.sub.0.51 N.sub.0.01 P.sub.0.99 active layer, a p-(Al.sub.0.7 Ga.sub.0.3).sub.0.51 In.sub.0.49 P cladding layer, and a p-GaAs contact layer.

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