Semiconductor light emitting device having quantum well...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure

Reexamination Certificate

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C257S079000, C257S012000, C257S014000

Reexamination Certificate

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06900467

ABSTRACT:
The principal surface of a substrate made of group III-V compound semiconductor is about (100) plane. A light emitting lamination structure is disposed on the principal surface. The light emitting lamination structure includes a quantum well layer made of group III-V mixed crystal semiconductor containing In, a pair of carrier confinement layers made of semiconductor material having a band gap wider than the quantum well layer and sandwiching the quantum well layer, and a pair of clad layers made of semiconductor material having a band gap wider than the carrier confinement layers and sandwiching the quantum well layer and the carrier confinement layers. A difference of 100 meV or larger exists between an energy level of the carrier confinement layers at a conduction band lower end and a ground level of an electron in the quantum well layer.

REFERENCES:
patent: 4819036 (1989-04-01), Kuroda et al.
Jones, K. A., et al., “Accurately determining the composition and thickness of layers in a GaAs/InGaAs superlattice.” Appl. Phys. 76 (3), Aug. 1, 1994, pp. 1609-1616.
Maier, M. , et al., “Composition analysis of molecular beam epitaxy grown InyGa1−yAs/GaAs/AlxGa1−xAs quantum wells by determination of film thickness.” J. Appl. Phys. 73 (8), Apr. 15, 1993, 0021-8979/93/083820-07, American Institute of Physics, pp. 3820-3826.
Pavesi, L. et al., “Photoluminescence of AlxGa1−xAs alloys.” J. Appl. Phys. 75 (10), 0021-8979/94/75(10)4779/64, May 15, 1994.

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