Semiconductor light emitting device and its manufacturing...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Compound semiconductor

Reexamination Certificate

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C438S047000, C438S045000, C257S101000, C257S102000

Reexamination Certificate

active

06924163

ABSTRACT:
Efficiency of leading out light released from an active layer, i.e. the external quantum efficiency, can be improved remarkably by processing a light lead-out surface to have an embossment. A layer containing a p-type dopant like magnesium (Mg) is deposited near the surface of a p-type GaN layer to diffuse it there, and a p-side electrode is made on the p-type GaN layer after removing the deposited layer. This results in ensuring ohmic contact with the p-side electrode, preventing exfoliation of the electrode and improving the reliability.

REFERENCES:
patent: 5617436 (1997-04-01), Lo
patent: 5633527 (1997-05-01), Lear
patent: 5905275 (1999-05-01), Nunoue et al.
patent: 5925898 (1999-07-01), Spath
patent: 5977566 (1999-11-01), Okazaki et al.
patent: 5981975 (1999-11-01), Imhoff
patent: 5990500 (1999-11-01), Okazaki
patent: 6194743 (2001-02-01), Kondoh et al.
patent: 6238945 (2001-05-01), Kaneko
patent: 4-340534 (1992-11-01), None
patent: 06-291368 (1994-10-01), None
patent: 08-102548 (1996-04-01), None
patent: 10-056206 (1998-02-01), None

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