Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Mesa formation
Reexamination Certificate
2011-03-01
2011-03-01
Nguyen, Dao H (Department: 2818)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Mesa formation
C438S031000, C438S039000, C438S040000, C438S046000, C438S047000, C257S094000, C257S096000, C257S098000, C257S101000, C257SE21110, C257SE21111, C257SE21449, C257SE31118, C257SE33023, C257SE33029, C372S045010, C372S046010
Reexamination Certificate
active
07897422
ABSTRACT:
A new structure of a semiconductor optical device and a method to produce the device are disclosed. One embodiment of the optical device of the invention provides a blocking region including, from the side close to the mesa, a p-type first layer and a p-type second layer. The first layer is co-doped with an n-type impurity and a p-type impurity. The doping concentration of the p-type impurity in the first layer is smaller than that in the second layer, so, the first layer performs a function of a buffer layer for the Zn diffusion from the second layer to the active layer in the mesa structure.
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Nguyen Dao H
Smith , Gambrell & Russell, LLP
Sumitomo Electric Industries Ltd.
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