Semiconductor light-emitting device and a method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With heterojunction

Reexamination Certificate

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C257S012000, C257S079000, C257SE33027, C257SE33028, C257SE33034, C372S043010, C372S046013

Reexamination Certificate

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07569862

ABSTRACT:
A method of manufacturing a semiconductor light-emitting device comprises selectively etching a semiconductor layer structure (16) fabricated in a nitride materials system and including an aluminum-containing cladding region or an aluminum-containing optical guiding region (5). The etching step forms a mesa (17), and also exposes one or more portions of the aluminum-containing cladding region or the aluminum-containing optical guiding region (5). The or each exposed portion of the aluminum-containing cladding region or the aluminum-containing optical guiding region (5) is then oxidized to form a current blocking layer (18) laterally adjacent to and extending laterally from the mesa. When an electrically conductive contact layer (11) is deposited, the current blocking layer (18) will prevent the contact layer (11) from making direct contact with the buffer layer (3).

REFERENCES:
patent: 6727112 (2004-04-01), Wang et al.
patent: 2002/0048835 (2002-04-01), Kwak
patent: 2002/0110945 (2002-08-01), Kuramata et al.
patent: 2003/0169795 (2003-09-01), Otoma et al.
Takashi Mukai, Recent Progress in Group-III Nitride Light-Emitting Diodes, Mar./Apr. 2002, IDDD Journal on Selected Topics in Quantum Electronics, vol. 8, No. 2, pp. 264-270.

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