Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Patent
1996-01-11
1999-02-02
Chaudhuri, Olik
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Heterojunction
372 46, H01L 2906
Patent
active
058669183
ABSTRACT:
A method of fabricating a semiconductor light emitting device includes forming an SiON film thinner than 50 nm on a stripe region on a surface of a first semiconductor layer at a first temperature, etching the first semiconductor layer using the SiON film as a mask and forming an optical waveguide including the first semiconductor layer which is left below the SiON film, and selectively growing a second semiconductor layer as a current blocking layer where the first semiconductor layer was removed by etching, using the SiON film as a mask at a second temperature. Therefore, adhesion of the material of the current blocking layer to the surface of the selective growth mask is suppressed, and imperfect growth of the contact layer and imperfect contact of the electrode directly formed on the upper surface of the wave-guide are suppressed, respectively. In addition, the generation of dark lines due to stress between the selective growth mask and the semiconductor layer constituting the upper part of the wave-guide is suppressed, and reduction in light output power is prevented.
REFERENCES:
patent: 5297158 (1994-03-01), Naitou et al.
Yamashita et al., "High-Power 780 nm AlGaAs Quantum-Well Lasers And Their Reliable Operation", IEEE Journal of Quantum Electronics, vol. 27, No. 6, 1991, pp. 1544-1549.
Hironaka Misao
Yamamoto Yousuke
Chaudhuri Olik
Mitsubishi Denki & Kabushiki Kaisha
Wille Douglas A.
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