Semiconductor laser having a doped active layer

Coherent light generators – Particular active media – Semiconductor

Reexamination Certificate

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C372S045010, C372S046010

Reexamination Certificate

active

07573925

ABSTRACT:
Semiconductor lasers having a doped active region. In one example embodiment, a laser includes a substrate and a doped active region positioned above the substrate. The doped active region includes a plurality of quantum wells separated by a plurality of barrier layers. The quantum wells and the barrier layers are doped with a doping material with a concentration between about 1*10^16/cm3 to about 1*10^17/cm3.

REFERENCES:
patent: 4092659 (1978-05-01), Ettenberg
patent: 4740987 (1988-04-01), McCall et al.
patent: 4859628 (1989-08-01), Knight et al.
patent: 4951292 (1990-08-01), Kuindersma et al.
patent: 5208821 (1993-05-01), Berger et al.
patent: 5450432 (1995-09-01), Okuda
patent: 5675601 (1997-10-01), Karakida et al.
patent: 5793787 (1998-08-01), Meyer et al.
patent: 6219366 (2001-04-01), Furushima
patent: 6618410 (2003-09-01), Fischer et al.
patent: 2002/0037024 (2002-03-01), Huang
patent: 2002/0114367 (2002-08-01), Stintz et al.
patent: 2002/0117675 (2002-08-01), Mascarenhas
patent: 2003/0002557 (2003-01-01), Eng et al.
patent: 2003/0179795 (2003-09-01), Moriya et al.
patent: 2004/0079967 (2004-04-01), Shakuda et al.
patent: 2004/0086017 (2004-05-01), Yoshida et al.
patent: 2004/0190835 (2004-09-01), Burdick et al.
patent: 2005/0031000 (2005-02-01), Botez
patent: 2000-340894 (2000-12-01), None
Sudo, Tsurugi, et al., Semiconductor Laser Having Low Stress Passivation Layer, U.S. Appl. No. 11/749,047, filed May 15, 2007.
Ha, Yuk Lung, et al., Epitaxial Regrowth in a Distributed Feedback Laser, U.S. Appl. No. 11/749,007, filed May 15, 2007.
Verma, Ashish K., et al., Thin INP Spacer Layer in High Speed Laser for Reduced Lateral Current Spreading, U.S. Appl. No. 11/749,003, filed May 15, 2007.
Dimitrov, Roman, et al., Method for Applying Protective Laser Facet Coatings, U.S. Appl. No. 11/749,052, filed May 15, 2007.
Dimitrov, Roman, et al., High Resistivity Engineered Laser Facet Coatings, U.S. Appl. No. 11/749,057, filed May 15, 2007.
Dimitrov, Roman et al., Laser Facet Pre-Coating Etch for Controlling Leakage Current, U.S. Appl. No. 11/749,061, filed May 15, 2007.
Sexl, M., Bohm G., Maier, M., Tranke, G., Weimann, G., & Abstreiter, G. (1997), MBE Growth of Metamorphic In(Ga)A/As Buffers. 1997 IEEE International Symposium on Compound Semiconductors, IEEE, 49-52.
U.S. Appl. No. 11/749,007, mailed Dec. 9, 2008, Office Action.
U.S. Appl. No. 11/749,047, mailed Aug. 12, 2008, Office Action.
U.S. Appl. No. 11/749,047, mailed Feb. 6, 2009, Notice of Allowance.
U.S. Appl. No. 11/749,033, mailed Jun. 2, 2008, Office Action.
U.S. Appl. No. 11/749,033, mailed Jan. 13, 2009, Notice of Allowance.
U.S. Appl. No. 11/749,057, mailed Dec. 11, 2008, Office Action.

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