Semiconductor laser formed by layer intermixing

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Dopant introduction into semiconductor region

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438 22, 438 46, 438 47, H01S 318, H01S 319

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active

058438025

ABSTRACT:
A method for fabricating a multiple layer semiconductor device, such as a laser, using impurity-induced, or vacancy-enhanced, intermixing of semiconductor layers to selectively inactivate quantum well regions in the device.

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