Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Mesa formation
Reexamination Certificate
2006-04-18
2006-04-18
Fourson, George (Department: 2823)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Mesa formation
C438S031000, C438S032000, C438S669000, C438S673000, C438S720000, C438S742000, C438S508000, C257SE33007
Reexamination Certificate
active
07029936
ABSTRACT:
A semiconductor laser element capable of reducing the contact resistance and the thermal resistance and realizing a high reliability is provided. The semiconductor laser element includes: a semiconductor substrate, an active layer formed on the semiconductor substrate, a ridge having a clad layer formed on the active layer and a contact layer formed on the clad layer, an insulation film covering the side surfaces of the clad layer, and an electrode connected to the contact layer, wherein the insulation layer has an end portion in the ridge thickness direction located between the upper surface and the lower surface of the contact layer.
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Fukai Haruki
Karita Hidetaka
Nakamura Atsushi
Yamashita Shigeo
Fourson George
Hitachi , Ltd.
Miles & Stockbridge P.C.
Pham Thanh V.
Renesas Eastern Japan Semiconductor Inc.
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