Semiconductor laser

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure

Reexamination Certificate

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C438S022000

Reexamination Certificate

active

10990376

ABSTRACT:
A light emitting layer forming section (8) including an n-type conductivity type clad layer (2), an active layer (3) and p-type conductivity type clad layers (4) and (6) is laminated on a semiconductor substrate (1), and further, a contact layer (9) made of a material having substantially the same lattice constant and thermal expansion coefficient as those of the semiconductor substrate is laminated on the light emitting layer forming section. The light emitting layer forming section and the contact layer are formed in such a manner as to satisfy the following inequality: 1.5≦(d1/d2)≦2.8, where d1represents the thickness of the contact layer, and d2represents the thickness of the light emitting layer forming section. As a consequence, it is possible to provide a semiconductor laser for a high output, in which a COD level can become high and a lifetime can be prolonged even if the light emitting layer forming section is as thick as 4 μm or more.

REFERENCES:
patent: 5189680 (1993-02-01), Kimura
patent: 2002/0014674 (2002-02-01), Hideyoshi et al.
patent: 2002/0044583 (2002-04-01), Samonji et al.
patent: 61-107782 (1986-05-01), None
patent: 11-233896 (1999-08-01), None
patent: 2001-185811 (2001-07-01), None
patent: 2003-086886 (2003-03-01), None
Hashimoto, Jun-ichi et. al., “A Highly Reliable GaInAs-GaInP 0.98-micro-m Window Laser”, IEEE Journal of Quantum Electronics, vol. 36, No. 8, Aug. 2000 (p. 971-977).
Japanese Office Action, May 2, 2007.

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