Semiconductor interconnect and method of making same

Details Semiconductor interconnect and method of making same Semiconductor interconnect and method of making same

2006-11-03

2009-11-17

Picardat, Kevin M (Department: 2822)

Active solid-state devices (e.g., transistors, solid-state diode

Combined with electrical contact or lead

Of specified material other than unalloyed aluminum

C257S750000, C257S760000, C438S622000, C438S643000, C438S653000

Reexamination Certificate

active

07619310

ABSTRACT:
An integrated circuit interconnect structure includes a conductive line, a first barrier layer disposed on a bottom surface of conductive line, a second barrier layer disposed on the top surface of the conductive line, and an interlevel dielectric surrounding the conductive line.

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