Semiconductor integrated circuit device and method of manufactur

Details Semiconductor integrated circuit device and method of manufactur Semiconductor integrated circuit device and method of manufactur

1995-05-17

1997-02-11

Thomas, Tom

Fishing, trapping, and vermin destroying

437 44, 437 52, H01L 218247

Patent

active

056020481

ABSTRACT:
An EEPROM (Electrically Erasable Programmable Read Only Memory) has a structure in which the corners of a floating gate electrode of each memory cell MISFET near the source region thereof are rounded.
The EEPROM is manufactured by a method characterized in that the ions of an impurity at a high dose are implanted in self-alignment with the floating gate electrode and control gate electrode of the memory cell MISFET so as to form the source and drain regions thereof, whereupon an oxidizing treatment is carried out.

REFERENCES:
patent: 4698787 (1987-10-01), Mulcherjee
patent: 5153144 (1992-10-01), Komori et al.
patent: 5445980 (1995-02-01), Komori et al.

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