Semiconductor integrated circuit device

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Including high voltage or high power devices isolated from...

Reexamination Certificate

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C257S565000, C257SE29012

Reexamination Certificate

active

07741694

ABSTRACT:
A semiconductor integrated circuit device according to the present invention includes an N-type embedded diffusion region between a substrate and an epitaxial layer in first and second island regions serving as small signal section. The N-type embedded diffusion region connects to N-type diffusion regions having supply potential. The substrate and the epitaxial layer are thus partitioned by the N-type embedded diffusion region having supply potential in the island regions serving as small signal section. This structure prevents the inflow of free carriers (electrons) generated from a power NPN transistor due to the back electromotive force of the motor into the small signal section, thus preventing the malfunction of the small signal section.

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patent: 06-104459 (1994-04-01), None
Miura, H. (ed.),Handybook Mechatronics, Tokyo: Ohmsha, Ltd., Mar. 25, 1996, pp. 204-205.

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