Semiconductor integrated circuit device

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

Reexamination Certificate

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C257SE23143

Reexamination Certificate

active

07400044

ABSTRACT:
To improve a degree of integration and reliability of a semiconductor integrated circuit device. There are included third wire14arranged in the same layer as first wire11and second wire12and arranged in a direction intersecting with the first wire11and the second wire12, first gate material wire18arranged between the first wire11and first well5in the vicinity of an intersecting point between wiring directions of the first wire11and the third wire14and electrically connected to the third wire14through via holes, and first diffusion layer6arranged in second well4in the vicinity of an intersecting point between wiring directions of the second wire12and the third wire14. The first diffusion layer6is electrically connected to the third wire14through via holes and each includes impurities having a concentration higher than each of the second wells4. The first gate material wire18and the first diffusion layer6are used as a wire path for substrate back-bias control associated with the third wire14.

REFERENCES:
patent: 2006/0292806 (2006-12-01), Nakamoto
patent: 61-196617 (1986-08-01), None

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