Semiconductor integrated circuit and fabrication method thereof

Inductor devices – Coil or coil turn supports or spacers – Printed circuit-type coil

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07414506

ABSTRACT:
A multilayer interconnection layer is provided on a semiconductor substrate. An inductor is provided on an insulating layer that forms the uppermost layer of the multilayer interconnection layer. The inductor is formed by spirally arranging a single wiring. On the insulating layer, a multilayer structure body is provided in an inner region of the inductor. In the multilayer structure body, a plurality of ferromagnetic cores formed of Ni are arranged in a matrix. The height of each ferromagnetic core is equal to or larger than the width thereof.

REFERENCES:
patent: 5396101 (1995-03-01), Shiga
patent: 5515022 (1996-05-01), Tashiro et al.
patent: 5532667 (1996-07-01), Haertling et al.
patent: 5852866 (1998-12-01), Kuettner et al.
patent: 5945902 (1999-08-01), Lipkes et al.
patent: 6198374 (2001-03-01), Abel
patent: 7053165 (2006-05-01), Furumiya et al.
patent: 2002/0050626 (2002-05-01), Onuma et al.
patent: 2003/0095026 (2003-05-01), Kawanobe
patent: 2004/0164835 (2004-08-01), Shoji
patent: 2005/0190035 (2005-09-01), Wang
patent: S61-161747 (1986-07-01), None
patent: H03-28758 (1991-03-01), None
patent: H04-63653 (1992-05-01), None
patent: 05-013234 (1993-01-01), None
patent: 05-013235 (1993-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor integrated circuit and fabrication method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor integrated circuit and fabrication method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor integrated circuit and fabrication method thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4012400

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.