Coating processes – Nonuniform coating – Mask or stencil utilized
Patent
1987-07-30
1989-07-11
Lawrence, Evan
Coating processes
Nonuniform coating
Mask or stencil utilized
29559, 118503, 118505, 118721, 118728, 4272481, B05D 132, B05C 1302, C23C 1604
Patent
active
048471194
ABSTRACT:
There is disclosed a method and apparatus for easily mounting, holding and facilitating the coating of preselected areas of very thin semiconductor samples. The apparatus includes a base adapted for placement in a coating chamber. The base includes a pair of spaced apart supporting arms onto which a plurality of stacked samples can be loaded. A cover is then slidably positioned over the stacked samples to hold the stacked samples in position during coating. The cover in conjunction with the supporting arms define an open sided cavity to enable the samples to be coated. The apparatus also can be used to hold only one sample.
REFERENCES:
patent: 4385083 (1983-05-01), Shelley
Chin Aland K.
Ford, Jr. John W.
Forouhar Siamak
Lawrence Evan
Payne Leslie J.
Polaroid Corporation
Roman Edward S.
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