Semiconductor heat-treating apparatus

Details Semiconductor heat-treating apparatus Semiconductor heat-treating apparatus

1987-02-26

1989-04-25

Bennet, Henry A.

Drying and gas or vapor contact with solids

Apparatus

Houses, kilns, and containers

432125, 34 38, F26B 306

Patent

active

048234800

ABSTRACT:
A semiconductor heat-treating apparatus comprising a heat treatment furnace main, gas discharging means surrounding the port for carrying semiconductors into or out of said furnace main therethrough, an internal cylindrical partition of said gas discharging means, said internal cylindrical partition engaging fittedly with said port for semiconductors, said gas discharging means being provided with a gas-stream forming system for discharging gases and a second gas-stream forming system for supplying inert gas into said cylindrical partition on the one side thereof and allowing the inert gas together with the gases from said furnace main to exit therefrom.

REFERENCES:
patent: 4223450 (1980-09-01), Rothchild
patent: 4318749 (1982-03-01), Mayer
patent: 4439146 (1984-03-01), Sugita
patent: 4518349 (1985-05-01), Tressler et al.
patent: 4597736 (1986-07-01), Moffat
patent: 4610628 (1986-09-01), Mizushina

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