Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2011-01-04
2011-01-04
Le, Brian Q (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S150000, C382S147000, C382S145000
Reexamination Certificate
active
07865012
ABSTRACT:
A failure analysis apparatus10is composed of an inspection information acquirer11for acquiring a failure observed image P2of a semiconductor device, a layout information acquirer12for acquiring layout information, and a failure analyzer13for analyzing a failure. The failure analyzer13extracts as a candidate interconnection for a failure, an interconnection passing an analysis region, out of a plurality of interconnections, using interconnection information to describe a configuration of interconnections in the semiconductor device by a pattern data group of interconnection patterns in respective layers, and, for extracting the candidate interconnection, it performs an equipotential trace of the interconnection patterns using the pattern data group, thereby extracting the candidate interconnection. This substantializes a semiconductor failure analysis apparatus, failure analysis method, and failure analysis program capable of securely and efficiently performing the analysis of the failure of the semiconductor device using the failure observed image.
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Hotta Kazuhiro
Majima Toshiyuki
Shimase Akira
Terada Hirotoshi
Drinker Biddle & Reath LLP
Hamamatsu Photonics K.K.
Le Brian Q
Park Edward
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