Semiconductor fabricating apparatus having vacuum control and de

Details Semiconductor fabricating apparatus having vacuum control and de Semiconductor fabricating apparatus having vacuum control and de

1997-06-10

1998-06-23

Czaja, Donald E.

Coating apparatus

Work holders, or handling devices

118703, B05C 1300, B05C 1100

Patent

active

057699488

ABSTRACT:
A vacuum control and detection system for a semiconductor fabricating apparatus includes a vacuum line connected to a plate for holding a semiconductor wafer to be processed. An electromagnetic valve is connected to the vacuum line for selectively opening and closing the vacuum line. A control unit receives a wafer sensing signal from the plate, and supplies an actuating voltage to the electromagnetic valve to open the vacuum line and securely hold the wafer to the plate via a vacuum force. A time delay device also receives the actuating voltage from the control unit and outputs a wafer holding signal to the control unit after a 2-3 second time delay. After wafer processing operations are completed, the control unit deactivates the actuating voltage supplied to the electromagnetic valve and the time delay device to close the vacuum line and release the vacuum force on the wafer.

REFERENCES:
patent: 3645581 (1972-02-01), Lasch, Jr. et al.

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