Semiconductor fabricating apparatus

Details Semiconductor fabricating apparatus Semiconductor fabricating apparatus

1983-03-16

1985-12-17

Lawrence, Evan K.

Coating apparatus

Gas or vapor deposition

With treating means

118 501, 219411, B05C 1100

Patent

active

045586608

ABSTRACT:
A semiconductor fabricating apparatus is capable of fabricating a high quality semiconductor with utilization of crystal growth, thermal oxidation of CVD membrane growth at low temperature. The semiconductor fabricating apparatus includes a reaction chamber having a gas inlet and a gas outlet, an insulative support means disposed in the reaction chamber for supporting semiconductor wafers thereon, an infrared lamp means for irradiating exposed surfaces of the semiconductor wafers and an ultra-violet lamp means for irradiating the exposed surfaces of the semiconductor wafers overlappingly with the infrared irradiation.

REFERENCES:
patent: 2820131 (1958-01-01), Kodama
patent: 4342794 (1982-08-01), Volker et al.

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