Image analysis – Applications – Manufacturing or product inspection
Patent
1995-06-05
1998-09-29
Razavi, Michael T.
Image analysis
Applications
Manufacturing or product inspection
348 87, 438 16, G06K 903
Patent
active
058155945
ABSTRACT:
A method of exposing a semiconductor substrate with an exposure apparatus and correcting the position, measured by a detector of the exposure apparatus, of the surface of the semiconductor substrate with respect to a focal plane of a projection optical system, includes the steps of printing an inspection pattern on a semiconductor inspection substrate with the exposure apparatus, developing the printed inspection pattern, obtaining an image of the developed inspection pattern with a charge-coupled device camera, calculating a measurement error in the position of the surface of the semiconductor inspection substrate measured by the detector during exposure of the semiconductor inspection substrate based upon the obtained image and storing the calculated measurement error in a controller, and correcting the measured position measured by the detector during subsequent exposure of the substrate by the exposure apparatus based upon the calculated measurement error stored in the controller. An apparatus for performing this method is also disclosed.
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Canon Kabushiki Kaisha
Chang Jon
Razavi Michael T.
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