Optics: measuring and testing – Angle measuring or angular axial alignment – With photodetection remote from measured angle
Patent
1985-08-05
1987-10-20
Buczinski, Stephen C.
Optics: measuring and testing
Angle measuring or angular axial alignment
With photodetection remote from measured angle
250202, G01B 1126, G01C 100
Patent
active
047010509
ABSTRACT:
A semiconductor focusing exposure apparatus in which an opposite face of a mask to a face to be illuminated by exposure light is illuminated with alignment light so that the light reflected from said opposite face may be used for alignment and which is equipped with a second moving arrangement which is separate from a moving arrangement for an x-y moving table supporting a wafer, for aligning the mask and the wafer in an orthogonal direction with respect to the optical axis of a focusing lens.
Moreover, the center of the flux of alignment pattern light for illuminating the wafer is made incident upon a line of intersection on which a plane containing the optical axis of an alignment optical system and the optical axis of said focusing lens and the incident plane of said focusing lens intersect with each other.
Still moreover, the optical path of the alignment light beam is aligned in parallel with a straight line joining an alignment mark formed on the diffraction pattern and the center of the entrance pupil of said focusing lens.
REFERENCES:
patent: 3989385 (1976-11-01), Dill et al.
patent: 4090068 (1978-05-01), Widmann et al.
patent: 4328553 (1982-05-01), Fredriksen et al.
patent: 4353087 (1982-10-01), Berry et al.
patent: 4357100 (1982-11-01), Mayer et al.
patent: 4444492 (1984-04-01), Lee
patent: 4496241 (1985-01-01), Mayer
patent: 4585337 (1986-04-01), Phillips
Nakashima Naoto
Nakata Toshihiko
Oshida Yoshitada
Shiba Masataka
Uto Sachio
Buczinski Stephen C.
Hitachi , Ltd.
Koltak Melissa L.
LandOfFree
Semiconductor exposure apparatus and alignment method therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Semiconductor exposure apparatus and alignment method therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor exposure apparatus and alignment method therefor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1609647