Semiconductor exposure apparatus

Details Semiconductor exposure apparatus Semiconductor exposure apparatus

1985-06-05

1986-01-14

Hix, L. T.

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

355 53, 355 91, G03B 2752, G03B 2720

Patent

active

045642842

ABSTRACT:
In a semiconductor exposure apparatus having chucks for holding a mask and a wafer, respectively, the holding portion of at least one of the chucks has a coefficient of linear expansion equal to or smaller than the coefficient of linear expansion of the bodies held. Particularly, the coefficient of linear expansion of the holding portion of the chuck should preferably be of a small absolute value, but even where the absolute value of the coefficient of linear expansion is great, the chucks are usable by providing temperature control.

REFERENCES:
patent: 4432635 (1984-02-01), Mayer
patent: 4496239 (1985-01-01), Isohata et al.
patent: 4503335 (1985-03-01), Takahashi

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