Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Process of making radiation-sensitive product
Patent
1989-08-08
1991-04-30
Martin, Roland
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Process of making radiation-sensitive product
430 85, 136258, 136261, 357 2, 357 30, 357 31, 427 531, 427 541, 313384, G03G 5082, B05D 306
Patent
active
050117599
ABSTRACT:
The present invention relates to a semiconductor element and a method of forming the same and various kinds of article in which said element is used.
Any material selected from the group consisting of SiH.sub.4, Si.sub.2 H.sub.6 and SiF.sub.4, and GeH.sub.4 or GeF.sub.4, are used as raw material gases. H.sub.2 is used as a diluent gas if necessary. A photochemical gas phase vapor deposition method is used, at a pressure of 0.1 to 20 Torr, an optical intensity of 10 to 1,000 mW/cm.sup.2, and a substrate temperature of 50.degree. to 250.degree. C. A semiconductor element formed of a -SiGe:H film having superior photoelectric conductivity, a method of forming a semiconductor element film containing Ge added thereto and having high long wave length-sensitivity and superior film quality can be provided. In addition, various kinds of articles such as a solar cell having superior long wave length-sensitivity in which said element is used in a carrier-producing layer, an electrophotographic sensitive member containing said element in a carrier-producing layer, and an image sensor, in which said element is used in a carrier-producing layer, having superior long wave length-sensitivity, can be provided.
REFERENCES:
patent: 4581249 (1986-04-01), Kamiya
patent: 4585671 (1986-04-01), Kitagawa et al.
Fujita Nobuhiko
Fukushima Kazuhiko
Hitotsuyanagi Hajime
Itozaki Hideo
Nakagama Syoji
Martin Roland
Sumitomo Electric Industries Ltd.
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