Semiconductor element and method for producing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With housing or contact structure

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S103000

Reexamination Certificate

active

06894317

ABSTRACT:
A semiconductor element including an electrically insulating substrate, semiconductor layers including first and second semiconductor layers of different conduction types and formed on the electrically insulating substrate, a first electrode formed on the first semiconductor layer, and a second electrode formed on the second semiconductor layer revealed by etching at least the first semiconductor layer, wherein a die-bonding electrode is formed on a side surface of the second electrode, on a side surface of the second semiconductor layer and on a region of from a side surface to a bottom surface of the electrically insulating substrate. Metal-metal contact is formed between the die-bonding electrode and the side surface of the second electrode, so that low-resistance contact is obtained here.

REFERENCES:
patent: 5798536 (1998-08-01), Tsutsui
patent: 6255129 (2001-07-01), Lin
patent: 57-004180 (1982-01-01), None
patent: 06-268258 (1994-09-01), None
patent: 08-083929 (1996-03-01), None
patent: 08-102549 (1996-04-01), None
patent: 08-255926 (1996-10-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor element and method for producing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor element and method for producing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor element and method for producing the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3381920

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.