Semiconductor diffusion furnace inner tube

Details Semiconductor diffusion furnace inner tube Semiconductor diffusion furnace inner tube

1989-08-15

1991-06-18

Kastler, S.

Metallurgical apparatus

Linings

Having particular lining element shape

266280, 266286, C21B 702

Patent

active

050244230

ABSTRACT:
An inner tube for use in a semiconductor diffusion furnace is provided comprising a liner or diffusion tube and an insulating layer formed on the entire outer surface of the tube by spraying, typically plasma spraying. The sprayed insulating layer is resistant to deterioration and peeling, ensuring an extended period of service for the tube.

REFERENCES:
patent: 2609318 (1952-09-01), Swentzel
patent: 2640503 (1953-06-01), Milligan et al.

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