Semiconductor devices with native aluminum oxide regions

Coherent light generators – Particular active media – Semiconductor

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372 46, 372 43, 372 49, H01S 319

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053735226

ABSTRACT:
A method of forming a native oxide from an aluminum-bearing Group III-V semiconductor material is provided. The method entails exposing the aluminum-bearing Group III-V semiconductor material to a water-containing environment and a temperature of at least about 375.degree. C. to convert at least a portion of said aluminum-bearing material to a native oxide characterized in that the thickness of said native oxide is substantially the same as or less than the thickness of that portion of said aluminum-bearing Group III-V semiconductor material thus converted. The native oxide thus formed has particular utility in electrical and optoelectrical devices, such as lasers.

REFERENCES:
patent: 3859178 (1975-01-01), Logan et al.
patent: 3890169 (1975-06-01), Schwartz et al.
patent: 3914465 (1975-10-01), Dyment et al.
patent: 3969164 (1976-07-01), Cho et al.
patent: 4116722 (1978-09-01), Kamei et al.
patent: 4144634 (1979-03-01), Chang et al.
patent: 4172906 (1979-10-01), Pancholy
patent: 4176206 (1979-11-01), Inoue
patent: 4216036 (1980-08-01), Tsang
patent: 4291327 (1981-09-01), Tsang
patent: 4374867 (1983-02-01), Nahory et al.
H. Barbe et al., "The growth of thin oxide layers on GaAs in methanol", Semiconductor Science and Technology, vol. 3, pp. 853-858 (1988). No month for reference.
J. P. Contour, et al., "An XPS Study of the Passivating Oxide Layer Produced on GaAs (001) Substrate by Heating in Air above 200 C.", Japanese Journal of Applied Physics, vol. 27, No. 2, pp. L167-L169 (Feb. 1988).
S. P. Murarka, "Thermal oxidation of GaAs", Applied Physics Letters, vol. 26, No. 4, pp. 180-181 (Feb. 25, 1975).
R. P. H. Chang et al., "Plasma oxidation of GaAs", Applied Physics Letters, vol. 29, No. 1, pp. 56-58 (Jul. 1, 1976).
Y. Gao et al., "Growth of Al oxide layers on GaAs (100) by reaction with condensed molecular oxygen", Journal of Applied Physics, 87(11), pp. 7148-7151 (Jun. 1, 1990).
C. W. Wilmsen et al., "The Improvement of Grown Oxides for the Surface Protection of III-V Compounds", Thin Solid Films, 51, pp. 93-98 (1978). No Month supplied with date of reference.
M. Hirose et al., Physica Status Solidi, (a)45, pp. K175-K177 (1978). No month on reference.
J. M. Dallesasse et al., "Environmental degradation of Al.sub.x Ga.sub.1-x As-GaAs quantum-well heterostructures" J. Appl. Phys., vol. 68, No. 5, pp. 2235-2238 (Sep. 1, 1990).
R. P. Chang et al., "Physical and electrical properties of plasma-grown oxide on Ga.sub.0.64 Al.sub.0.36 As" J. Appl. Phys., vol. 48, No. 12, pp. 5384-5386 (Dec. 1977).
The Anadic Behavior of metals and Semiconductors Series, vol. 4, "Oxides and Oxide Films", John W. Diggle and Ashok K. Vijh, Eds. Marcel Dekker, Inc., pp. 190-191, 250-251 (1976). No month for reference.
Comprehensive Inorganic Chemistry, J. C. Bailar Jr. et al., Eds. Pergamon Press, pp. 1032-1036, 1090-1093 (1973). No month for reference.
C. Misra, Industrial Alumina Chemicals, ACS Monograph 184, pp. 1-165 (1986). No month for reference.
V. G. Hill et al. "The System Alumina-Gallia-Water", Journal of the American Ceramic Society, vol. 35, No. 6, pp. 135-142 (Jun. 1, 1952).
G. C. Kennedy, "Phase Relations in the System AL.sub.2 O.sub.3 -H.sub.2 O at High Temperatures and Pressures", American Journal of Science, vol. 257, pp. 563-573 (Oct. 1959).
S. Matsushima et al., "A Study of Equilibrium Relations in the System S of Al.sub.2 O.sub.3 -SiO.sub.2 -H.sub.2 O and Al.sub.2 O.sub.3 -H.sub.2 O", American Journal of Science, vol. 265, pp. 28-44, (Jan., 1967).
E. M. Levin et al., Phase Diagrams for Ceramists (1964) and Phase Diagrams for Ceramists 1975 Supplement, M. Reser, Ed., The American Ceramin Society, Figures 1926, 1927, 4021, 4965, 2008 and 310. No month for reference.
M. Rubenstein, "The Oxidation of GaP and GaAs", Journal of Electrochem. Soc., vol. 113, No. 6, Jun., 1966, pp. 540-542.
B. Schwartz, "Preliminary Results on the Oxidation of GaAs and GaP during Chemical Etching", Journal of Electrochem. Soc., vol. 118, No. 4, Apr. 1971, pp. 657-680.

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