Patent
1979-08-31
1981-02-10
Edlow, Martin H.
357 23, 357 55, H01L 2702, H01L 2906
Patent
active
042505194
ABSTRACT:
A semiconductor device has VMOS transistors and VMOS dynamic memory cells which are formed on the same semiconductor substrate of a first conductivity type. A buried layer of the opposite conductivity type is formed between the substrate and an epitaxial layer having V-grooves for the VMOS dynamic memory cells. In the buried layer are formed buried layers of the first conductivity type serving as sources and capacitors for the VMOS dynamic memory cells.
REFERENCES:
patent: 4065783 (1977-12-01), Ouyong
patent: 4084175 (1978-04-01), Ouyang
patent: 4109270 (1978-08-01), von Basse
patent: 4131097 (1978-12-01), Ouyang
patent: 4173765 (1979-11-01), Heald
patent: 4194283 (1980-03-01), Hoffmann
Miyasaka Kiyoshi
Mogi Jun-ichi
Edlow Martin H.
Fujitsu Limited
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