Semiconductor devices having a mesa structure and method of fabr

Active solid-state devices (e.g. – transistors – solid-state diode – Physical configuration of semiconductor – Mesa structure

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Details

257627, 156647, 148106, 148DIG115, H01L 2906

Patent

active

053999010

ABSTRACT:
A semiconductor rectifier device includes a mesa structure formed on a surface of a monocrystalline silicon wafer, the mesa having four side walls meeting at rounded corner walls. The slope of the mesa side walls is 45 degrees and the slope of each corner wall varies between 45 and 54 degrees. The mesa is fabricated by providing a square etchant mask having rounded corners on a <100> crystal plane of a silicon wafer with the straight sides of the mask disposed at an angle of 45 degrees with <111> directions on the wafer surface. The mask corners are symmetrical and comprise, from a mid point of the corners, oppositely extending short straight lines forming an angle of 150 degrees or less therebetween. The rear end of each short line is connected by a series of end to end straight lines angled relative to one another to form a generally smooth line merging with straight sides of the mask. The lengths of the short straight lines are related to the location of a surface intercept of a P-N junction within the mesa structure with the mesa side walls, and the angles between the short straight lines are related to the desired maximum variations in the location of the surface intercept of a high-low junction within the mesa with the mesa side walls. The mesa structure is formed by anisotropically etching the masked silicon wafer.

REFERENCES:
patent: 3765969 (1973-10-01), Kragness et al.
patent: 4155783 (1979-05-01), Feist
patent: 4255757 (1981-03-01), Hikin
patent: 4373255 (1983-02-01), Goronkin
patent: 4740477 (1988-04-01), Einthoven et al.
patent: 4891685 (1990-01-01), Einthoven et al.
patent: 5020023 (1991-04-01), Einthoven et al.

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