Semiconductor device with spiral inductor and method for...

Semiconductor device manufacturing: process – Making passive device

Reexamination Certificate

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C257S531000, C257S700000, C257S621000

Reexamination Certificate

active

06951794

ABSTRACT:
A spiral inductor comprising: a substrate; a protruding portion which is formed on the top face of the substrate and the top of which serves as a dummy element for controlling a chemical mechanical polishing process; and a conductive layer which is formed on the substrate so as to have a spiral shape and which serves as an induction element, wherein the protruding portion is formed in a region other than a region directly below the conductive layer.

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patent: 03-82053 (1991-04-01), None
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patent: 11-233727 (1999-08-01), None
patent: 2000-040786 (2000-02-01), None
patent: 2001-352039 (2001-12-01), None

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