Semiconductor device with improved contact and method of making

Fishing – trapping – and vermin destroying

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Details

437186, 437187, 437180, H01L 2128

Patent

active

052926842

ABSTRACT:
A semiconductor device with an improved contact capable of improving junction breakdown voltage and junction leakage current by forming a contact at an active region without damaging bird's beak portions of its element-isolation oxide films and a method of making this semiconductor device. The semiconductor device comprises element-isolation oxide films formed on a semiconductor substrate, an etch barrier material film formed on bird's beak portions of element-isolation oxide films, an insulating film formed over the element-isolation oxide films and the etch barrier material layer, and a conductive material layer formed over the insulating film and in contact with the active region. In order to prevent the bird's beak portions of element-isolation oxide films from being damaged upon the formation of contact hole, the etch barrier material film has an etch selectivity different from that of a silicon oxide film formed on the active region.

REFERENCES:
patent: 3681153 (1970-01-01), Clark et al.
patent: 4325169 (1982-04-01), Ponder et al.
patent: 4740483 (1988-04-01), Tobin
patent: 5008216 (1991-04-01), Huang et al.
patent: 5169800 (1992-12-01), Kobayashi

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