Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation
Patent
1995-08-29
1997-07-15
Crane, Sara W.
Active solid-state devices (e.g., transistors, solid-state diode
Responsive to non-electrical signal
Electromagnetic or particle radiation
257656, 257 52, 257 53, 136258, H01L 31075
Patent
active
056486758
ABSTRACT:
In the present invention, atoms are implanted into the surface of at least a crystalline silicon semiconductor of one conductivity type in forming a heterojunction, thereby to bring the surface of the crystalline silicon semiconductor into amorphous to form a substantially intrinsic amorphous silicon layer. An amorphous silicon layer or a microcrystalline silicon layer of an opposite conductivity type is deposited on the amorphous silicon layer, whereby a heterojunction interface is formed in a region deeper than a deposition interface.
REFERENCES:
patent: 4946514 (1990-08-01), Nakagawa et al.
patent: 5213628 (1993-05-01), Noguchi et al.
patent: 5371380 (1994-12-01), Saito et al.
Harada Yasuki
Terada Norihiro
Crane Sara W.
Hardy David B.
Sanyo Electric Co,. Ltd.
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