Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...
Patent
1997-03-12
1999-04-13
Thomas, Tom
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Field effect device in non-single crystal, or...
257 59, 257 69, 257 72, 257285, 257287, 257347, 257506, 438166, 438175, 438486, 438571, H01L 31036
Patent
active
058941371
ABSTRACT:
There is provided a technique for fabricating a thin film transistor having excellent performance. A configuration is employed in which when the thin film transistor is in an on-state, the flowing direction of the on-current coincides with the direction of crystal growth. With such a configuration, grain boundaries of the crystalline silicon in the active layer will not block the on-current. Further, when the thin film transistor is in an off-state, the off-current is always orthogonal to the grain boundaries of the crystalline silicon. The grain boundaries of the crystalline silicon effectively suppresses the off-current in such locations.
REFERENCES:
patent: 5604360 (1997-02-01), Zhang et al.
Fukunaga Takeshi
Ohtani Hisashi
Yamazaki Shunpei
Abraham Fetsum
Semiconductor Energy Laboratory Co,. Ltd.
Thomas Tom
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