Semiconductor device with a frequency selective guard ring

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

Reexamination Certificate

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Details

C257S376000, C257S394000, C257S409000, C257S379000, C257S516000, C257S528000, C257S532000

Reexamination Certificate

active

06995450

ABSTRACT:
A ring-shaped P+type diffusion region is formed on the top surface of a P type substrate in such a way as to surround a single internal circuit region. A shunt wiring is formed in an area including directly above the P+type diffusion region on the P type substrate. The shunt wiring is connected to the P+type diffusion region by a plurality of contacts. The shunt wiring is provided with an annular ring portion surrounding the internal circuit region. A meander inductor led out from the ring portion and the one end of the meander inductor is connected to a ground potential wiring. A resonance circuit is formed by a parasitic capacitor and the inductance of the shunt wiring. The parasitic capacitor is formed between the shunt wiring and the P+type diffusion region on the P type substrate.

REFERENCES:
patent: 5475255 (1995-12-01), Joardar et al.
patent: 6002161 (1999-12-01), Yamazaki
patent: H9-326468 (1997-12-01), None
patent: 2001-044277 (2001-02-01), None

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