Semiconductor device, method of manufacturing the same, and...

Details Semiconductor device, method of manufacturing the same, and... Semiconductor device, method of manufacturing the same, and...

2010-01-28

2011-11-29

Lindsay, Jr., Walter L (Department: 2812)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C257S774000, C257S773000

Reexamination Certificate

active

08067313

ABSTRACT:
Disclosed is a method of manufacturing a semiconductor device including forming a transistor on a first surface of a device substrate, forming a hole in a second surface opposite to the first surface of the device substrate, and supplying hydrogen to a gate insulating film of the transistor from the second surface of the device substrate through the hole.

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