Semiconductor device, method for manufacturing semiconductor...

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – With pn junction isolation

Reexamination Certificate

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C257S554000, C257SE29019, C257SE29174

Reexamination Certificate

active

07968970

ABSTRACT:
A semiconductor device is presented, which includes a semiconductor substrate with a high concentration impurity of a first type conductivity and an epitaxial layer with a low concentration impurity provided on the semiconductor substrate, where a trench coupled to the semiconductor substrate is provided in the epitaxial layer with the low concentration impurity. And the semiconductor device further includes a high concentration impurity region of the first type conductivity having the same type conductivity as the type of the semiconductor substrate formed in at least the epitaxial layer with the low concentration impurity along an inner wall of the trench and coupled to the semiconductor substrate with the high concentration impurity of a first type conductivity, and contacts formed on the high concentration impurity region of the first type conductivity.

REFERENCES:
patent: 4704368 (1987-11-01), Goth et al.
patent: 2006/0076629 (2006-04-01), Yilmaz
patent: 59-232439 (1984-12-01), None
patent: 05-109884 (1993-04-01), None
patent: 11-214398 (1999-08-01), None

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