Semiconductor device manufacturing unit

Details Semiconductor device manufacturing unit Semiconductor device manufacturing unit

1980-10-28

1984-12-11

Smith, John D.

Coating apparatus

Gas or vapor deposition

With treating means

118729, 118725, 118500, 118733, C23C 1308

Patent

active

044871619

ABSTRACT:
A semiconductor device manufacturing unit in which plasma gas is maintained sealed in a quartz tube by a magnet disposed outside the quartz tube to make the density of plasma gas high and uniform thereby improving the quality of CVD films deposited with the gas and reducing the processing time for semiconductor wafers. A wafer holder is movably mounted in the quartz tube. A support bar is provided for moving the wafer holder with the support bar serving additionally as a ground electrode. An RF electrode and magnet are disposed outside the quartz tube. A heater may be disposed outside the RF electrode and magnet.

REFERENCES:
patent: 3297465 (1967-01-01), Connell et al.
patent: 3485666 (1969-12-01), Sterling et al.
patent: 3843392 (1974-10-01), Sterling et al.
patent: 3875068 (1975-04-01), Mitzel
patent: 3916034 (1975-10-01), Tsuchimoto
patent: 4129090 (1978-12-01), Inaniwa et al.
patent: 4178877 (1979-12-01), Kudo
patent: 4223048 (1980-09-01), Engle, Jr.

Affiliated with

Also associated with

Rating

Semiconductor device manufacturing unit does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device manufacturing unit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device manufacturing unit will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1457872