Semiconductor device manufacturing methods

Details Semiconductor device manufacturing methods Semiconductor device manufacturing methods

1988-04-25

1990-03-06

Silverman, Stanley

Coating processes

Direct application of electrical, magnetic, wave, or...

Ion plating or implantation

21912167, 2191217, 21912172, B05D 306

Patent

active

049064916

ABSTRACT:
In a photoelectric conversion device manufacturing method which includes at least a step of forming a non-single-crystal semiconductor layer, a transparent or nontransparent layer, or a laminate member composed of transparent and nontransparent layers by patterning with a laser beam, a laser beam which has a short wavelength of 600 nm or less, a spot diameter of 3 to 60 nm and a width of 50 nano-second is used for the patterning.

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patent: 4472456 (1984-09-01), Shah
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