Semiconductor device manufacturing method with use of gas includ

Details Semiconductor device manufacturing method with use of gas includ Semiconductor device manufacturing method with use of gas includ

1997-09-22

1999-04-27

Utech, Benjamin

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

252 79, 252153, C23F 100

Patent

active

058973770

ABSTRACT:
A semiconductor device manufacturing method includes an etching process or a surface-treating process in which an etching gas or a surface-treating gas including an acyl-group-containing compound represented by the following formula (1):

REFERENCES:
patent: 4215005 (1980-07-01), Vander Mey
patent: 4732837 (1988-03-01), Plotvin et al.
patent: 5158854 (1992-10-01), Imamura et al.

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